MAGPULS GmbH: HiPIMS Puls power supplies
HiPIMS Pulse power supplies model MAGPULS HPP
Thanks to the short extremely high peak current pulses the pulse power supplies model MAGPULS HPP generate plasma intensity with highest density which leads to an excellent coating quality in high-pulse sputtering (HIPIMS).
- Excellent film properties in terms of wear resistance, adhesive strength, hardness and homogeneity
- Easy integration in existing magnetron sputter systems
Applications:
Novel PVD HIPIMS sputtering to produce hard coatings with very good wear and corrosion properties. Pulse power up to 12MW generates an extremely high ionization density without droplets. Further applications are in the plasma-treatment of surface and trench-filling and etching.
Features and Benefits:
Active ARC-suppression -> Prevention of drop formation in superior surface finish
Peak current limit -> Easy adaptation to different Process conditions to avoid overheating of the substrate or magnetron
Pulse power up to 12MW -> Excellent flexibility for different HPIMS processes in R&D and industry
Pulse -and Pulse pause time -> Optimum process stability and layer control
Product overview
Model |
max. Puls-Power |
Puls Current |
Voltage |
Frequency |
Puls time |
|---|---|---|---|---|---|
| MAGPULS 1000/1000 HPP | 1MW | 0 - 1000A | 0 - 1000V | 1kHz | 10µs – 300µs |
| MAGPULS 1000/2000 HPP | 2MW | 0 - 2000A | 0 - 1000V | 1kHz | 10µs – 300µs |
| MAGPULS 2000/1000 HPP | 2MW | 0 - 1000A | 0 - 2000V | 1kHz | 10µs – 300µs |
| MAGPULS 2000/2000 HPP | 4MW | 0 - 2000A | 0 - 2000V | 1kHz | 10µs – 300µs |
| MAGPULS 2000/3000 HPP | 6MW | 0 - 3000A | 0 - 2000V | 1kHz | 10µs – 300µs |
Magpuls
Stromversorgungs Systeme GmbH
Dipl. Ing. Dieter Schorn
Chief executive
Im Unterfeld 19
D-76547 Sinzheim
Tel.: +49 (0) 72 21 . 98 78 50
Fax: +49 (0) 72 21 . 98 74 54
E-Mail: info∂magpuls.de
HiPIMS-Puls Power Supplies
series MAGPULS HPP
